New method for optical proximity correction with gray-level serifs

Jinglei Du; Qizhong Huang; Yongkang Guo; Zheng Cui

doi:10.1117/12.310722

29 June 1998 New method for optical proximity correction with gray-level serifs

Jinglei Du, Qizhong Huang, Yongkang Guo, Zheng Cui

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310722
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Based on analysis of physical mechanics on optical proximity effect, we present a new method for fine correction of optical proximity effect and point out that the optimum of amplitude distribution on mask can improve distribution of spatial frequency spectrum, so intensity distribution of printed image near ideal distribution can be obtained. The simulation results show that deviation between contour of image after OPC and contour of ideal image is less than 0.009.

Citation Download Citation

Jinglei Du, Qizhong Huang, Yongkang Guo, and Zheng Cui "New method for optical proximity correction with gray-level serifs", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310722

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