Optimizing image transfer into AZ BARLi bottom coat for submicron i-line lithography

Alberto Caligiore; Marco Valtolina; Alberto Cipolli; Arialdo Monguzzi; Fred Mohr; Mark A. Spak; Ralph R. Dammel

doi:10.1117/12.312388

29 June 1998 Optimizing image transfer into AZ BARLi bottom coat for submicron i-line lithography

Alberto Caligiore, Marco Valtolina, Alberto Cipolli, Arialdo Monguzzi, Fred Mohr, Mark A. Spak, Ralph R. Dammel

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312388
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The use of bottom antireflective coatings is one of the techniques that enable the fab engineer to extend the life of conventional i-line lithography into the deep submicron range. Spin-on antireflective coatings are highly effective in reducing the swing curve as well as standing wave and notching phenomena, and can be made to show extensive planarization. However, organic spin-on BARCs show lower etch selectivity than inorganic layers, so that they require specific attention in the dry etch image transfer step due to the potential for resist film loss. In this paper, we show that the interplay between the characteristics of wet developed features and of the dry etch image transfer step can be utilized to expand the process window for both isolated and dense lines in a 0.34 micrometers i-line production process.

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Alberto Caligiore, Marco Valtolina, Alberto Cipolli, Arialdo Monguzzi, Fred Mohr, Mark A. Spak, and Ralph R. Dammel "Optimizing image transfer into AZ BARLi bottom coat for submicron i-line lithography", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312388

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