Monte Carlo simulations of electron-beam/solid interactions as an aid in interpretation of EDS and auger analysis of particles and defects

Jeffrey R. Kingsley; David W. Harris

doi:10.1117/12.308760

8 June 1998 Monte Carlo simulations of electron-beam/solid interactions as an aid in interpretation of EDS and auger analysis of particles and defects

Jeffrey R. Kingsley, David W. Harris

Author Affiliations +

Proceedings Volume 3332, Metrology, Inspection, and Process Control for Microlithography XII; (1998) https://doi.org/10.1117/12.308760
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

In this study we model the interaction of an electron beam with small (less than 0.5 microns) particles in order to understand the limitations and advantages of several analytical techniques. From this study we see that both Auger and EDS have advantages depending on particle size and desired information. In general, lower voltage is favored for small particle analysis by EDS, while high voltage gives the best small particle results with Auger.

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Jeffrey R. Kingsley and David W. Harris "Monte Carlo simulations of electron-beam/solid interactions as an aid in interpretation of EDS and auger analysis of particles and defects", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308760

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