Transient thermal distortions of x-ray mask membranes during exposure scanning

Zhaohua Feng; Roxann L. Engelstad; Edward G. Lovell; Franco Cerrina

doi:10.1117/12.309579

5 June 1998 Transient thermal distortions of x-ray mask membranes during exposure scanning

Zhaohua Feng, Roxann L. Engelstad, Edward G. Lovell, Franco Cerrina

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309579
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

During x-ray lithography exposure scanning, intensive x-ray energy deposition in the mask membrane and absorbers causes thermal stresses and mask distortions. Transient heat transfer and thermal distortion models of the masks are presented in this paper. The x-ray beam, which has a Gaussian distribution in the vertical direction and is uniform in the horizontal direction, intermittently scans the pattern area in the vertical direction. The models were used to analyze the ARPA-NIST National x-ray Mask Standard with a 50 mm X 50 mm field size. Effects of exposure parameters are discussed.

Citation Download Citation

Zhaohua Feng, Roxann L. Engelstad, Edward G. Lovell, and Franco Cerrina "Transient thermal distortions of x-ray mask membranes during exposure scanning", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309579

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