Imaging interferometric lithography for arbitrary patterns

Xiaolan Chen; Steven R. J. Brueck

doi:10.1117/12.309621

5 June 1998 Imaging interferometric lithography for arbitrary patterns

Xiaolan Chen, Steven R. J. Brueck

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309621
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Conventional optical lithography (OL) is limited by the spatial frequency coverage of the optical system. Inter- ferometric lithography (IL), which approaches the ultimate linear system spatial frequency coverage limit of optics, provides a simple technique to produce periodic patterns at the requisite scale for the next several ULSI generations. Imaging interferometric lithography (IIL), a true integration of optical and interferometric lithography, extends this capability to arbitrary pattern fabrication. Modeling and simulation results show that arbitrary patterns with dense CDs extending to 120-nm at I-line and to 65-nm at a 193-nm exposure wavelength are possible. Initial experiments demonstrate that the coverage in frequency space is increased for a 3-exposure IIl configuration and the resolution is concomitantly increased by a factor of 3. Development of IIL may extend the life of optical lithography to sub-100-nm CD generations.

Citation Download Citation

Xiaolan Chen and Steven R. J. Brueck "Imaging interferometric lithography for arbitrary patterns", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309621

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