X-Ray Mask Fabrication

Daniel L. Brors

doi:10.1117/12.933420

30 June 1982 X-Ray Mask Fabrication

Daniel L. Brors

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933420
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

X-ray lithography is composed of three elements, the alignment machine with an X-ray source, X-ray photomasks, and X-ray resist. This paper describes the processes used to manufacture boron-nitride X-ray masks and some of the results using those masks.

Citation Download Citation

Daniel L. Brors "X-Ray Mask Fabrication", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933420

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