Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

Azalia A. Krasnoperova; Hiroshi Ito; Gregory Breyta; Debra Fenzel-Alexander

doi:10.1117/12.275871

7 July 1997 Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography

Azalia A. Krasnoperova, Hiroshi Ito, Gregory Breyta, Debra Fenzel-Alexander

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275871
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

In this paper, experimental formulations of ESCAP photoresist with two different photoacid generators (PAG) are compared for x-ray and DUV (248 nm) exposures. Sensitivities, chemical contrasts and development selectivities have been derived from dissolution rate and FTIR data collected under similar process conditions. X-ray exposed experimental resists are also compared to a commercial UVIIHS photoresist. Linewidth performances of the x-ray exposed resists are presented at 175 nm ground rules. Relationships between the photoresists contrasts (both chemical and development), dissolution rates of fully exposed and unexposed resists, aerial image properties and linewidth exposure budget are discussed. Effect of a dissolution inhibitor on x-ray linewidth performance is shown.

Citation Download Citation

Azalia A. Krasnoperova, Hiroshi Ito, Gregory Breyta, and Debra Fenzel-Alexander "Comparative study of positive chemically amplified photoresist performance for x-ray and DUV lithography", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275871

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available