Polishability of CERAFORM silicon carbide

Mark A. Ealey; John A. Wellman

doi:10.1117/12.258290

11 November 1996 Polishability of CERAFORM silicon carbide

Mark A. Ealey, John A. Wellman

Author Affiliations +

Proceedings Volume 2857, Advanced Materials for Optical and Precision Structures; (1996) https://doi.org/10.1117/12.258290
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

Recent advances in polishing the bare CERAFORM SiC surface to finishes as smooth as 1OA rms has enhanced the viability of SiC as a mirror material those applications requiring thermal stability over a broad temperature range. In addition PVD silicon claddings have been developed to provide a low cost polishing option for more environments which are less severe. With the ability to make complex shapes in sizes up to 1 meter, CERAFORM SiC provides a cost-effective alternative to beryllium and glass.

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Mark A. Ealey and John A. Wellman "Polishability of CERAFORM silicon carbide", Proc. SPIE 2857, Advanced Materials for Optical and Precision Structures, (11 November 1996); https://doi.org/10.1117/12.258290

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