Fast-marching level-set methods for three-dimensional photolithography development

James A. Sethian

doi:10.1117/12.240962

7 June 1996 Fast-marching level-set methods for three-dimensional photolithography development

James A. Sethian

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240962
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The fast marching method, introduced by Sethian, is a numerical technique for solving the Eikonal equation, and results from combining upwind schemes for viscosity solutions of Hamilton-Jacobi equations, narrow band level set methods, and a fast min-heap algorithm. On a rectangular grid of N total points, the fast marching level set method computes the solution to the Eikonal equation from given initial data in O(N log N) steps. In a series of papers, we have applied this technique to a wide collection of problems, including construction of geodesics on surfaces, computer vision, and shape-from-shading. In this paper, we analyze the application of the fast marching method to photolithography development.

Citation Download Citation

James A. Sethian "Fast-marching level-set methods for three-dimensional photolithography development", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240962

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