Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

Yasunobu Onishi; Kazuo Sato; Kenzi Chiba; Masafumi Asano; Hirokazu Niki; Rumiko Horiguchi Hayase; Takao Hayashi

doi:10.1117/12.241861

14 June 1996 Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

Yasunobu Onishi, Kazuo Sato, Kenzi Chiba, Masafumi Asano, Hirokazu Niki, Rumiko Horiguchi Hayase, Takao Hayashi

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241861
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The resist performance for quarter- and sub-quarter-micron domains using partially t- butoxycarbonylmethylated poly(4-vinylphenol) (BOCM-PVP) as a polymer dissolution inhibitor is reported. This resist contains some additives to improve resolution and process stability. This resist has high resolution, with linearity down to 0.225 micrometer L & S at 38 mJ/cm² on a KrF excimer laser stepper (NA equals 0.5, sigma equals 0.5) with a COG mask. Using a halftone phase shifting mask, 0.175 micrometer L & S patterns are resolved with a 1 micrometer depth of focus (DOF) on a KrF excimer stepper (NA equals 0.5, sigma equals 0.7, 1/2 annular illumination). The line width change vs. PEB temperature ((Delta) CD/(Delta) T) is 1.3 nm/degree. The line width shift over time between exposure and PEB is within plus or minus 0.01 micrometer even after 1 hr delay in a basic- contamination-free environment (NH₃ less than 1 ppb).

Citation Download Citation

Yasunobu Onishi, Kazuo Sato, Kenzi Chiba, Masafumi Asano, Hirokazu Niki, Rumiko Horiguchi Hayase, and Takao Hayashi "Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241861

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available