Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras

Avijit K. Ray-Chaudhuri; Rodney P. Nissen; Kevin D. Krenz; Richard H. Stulen; William C. Sweatt; Mial E. Warren; Joel R. Wendt; Stanley H. Kravitz; John E. Bjorkholm

doi:10.1117/12.218412

8 September 1995 Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras

Avijit K. Ray-Chaudhuri, Rodney P. Nissen, Kevin D. Krenz, Richard H. Stulen, William C. Sweatt, Mial E. Warren, Joel R. Wendt, Stanley H. Kravitz, John E. Bjorkholm

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Proceedings Volume 2536, Optical Manufacturing and Testing; (1995) https://doi.org/10.1117/12.218412
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

When characterizing an extreme ultraviolet (EUV) lithographic optical system, visible light interferometry is limited to measuring wavefront aberration caused by surface figure error while failing to measure wavefront errors induced by the multilayer coatings. This fact has generated interest in developing interferometry at an EUV camera's operational wavelength (at wavelength testing), which is typically around 13 nm. While a laser plasma source (LPS) is being developed as a lithography production source, it has generally been considered that only an undulator located at a synchrotron facility can provide the necessary laser-like point source for EUV interferometry. Although an undulator-based approach has been successfully demonstrated, it would be advantageous to test a camera in its operational configuration. We are developing the latter approach by utilizing extended source size schemes to provide usable flux throughput. A slit or a grating mounted in front of the source can provide the necessary spatial coherence for Ronchi interferometry. The usable source size is limited only by the well-corrected field of view of the camera under test. The developemnt of this interferometer will be presented.

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Avijit K. Ray-Chaudhuri, Rodney P. Nissen, Kevin D. Krenz, Richard H. Stulen, William C. Sweatt, Mial E. Warren, Joel R. Wendt, Stanley H. Kravitz, and John E. Bjorkholm "Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras", Proc. SPIE 2536, Optical Manufacturing and Testing, (8 September 1995); https://doi.org/10.1117/12.218412

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KEYWORDS

Extreme ultraviolet

Interferometry

Cameras

Reflectivity

Extreme ultraviolet lithography

Wavefronts

Multilayers

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