Fast-resist image estimation methodology using light-intensity distribution

Keisuke Tsudaka; Manabu Tomita; Minoru Sugawara; Hiroichi Kawahira; Satoru Nozawa

doi:10.1117/12.212804

3 July 1995 Fast-resist image estimation methodology using light-intensity distribution

Keisuke Tsudaka, Manabu Tomita, Minoru Sugawara, Hiroichi Kawahira, Satoru Nozawa

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212804
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

A fast resist image estimation methodology using light intensity distribution is proposed. Recently, some optical proximity effect correction (OPC) methods have been developed. Conventionally, to apply light intensity simulation of OPC, resist image has been simply estimated as a contour at which light intensity distribution is sliced. However, it is difficult to obtain a real resist image with this conventional method because of no consideration of actual resist process. Now, we have developed a new method which can estimate resist image with simple approximate calculation of light intensity distribution. In this method, resist image can be calculated from light intensity distribution using convolution. Using this method, calculation accuracy can be improved twice compared to that with a conventional light intensity slicing method. In this paper, the method is described in detail, then its feasibility to be applied to OPC will be demonstrated.

Citation Download Citation

Keisuke Tsudaka, Manabu Tomita, Minoru Sugawara, Hiroichi Kawahira, and Satoru Nozawa "Fast-resist image estimation methodology using light-intensity distribution", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212804

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