Current technological status of spatial filtering method for soft defect detection

Tsuneyuki Hagiwara

doi:10.1117/12.212796

3 July 1995 Current technological status of spatial filtering method for soft defect detection

Tsuneyuki Hagiwara

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212796
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

Laser-based mask inspection systems are indispensable to attaining better yield, in both the semiconductor manufacturing process and the mask manufacturing process, because of their high throughput. We describe this issue citing the operational principle of our AM-601D (A reticle particle inspection system that we manufacture, rated sensitivity: 0.5 micron), which is based on a spatial filtering method with a raster scanning of a focused laser beam.

Citation Download Citation

Tsuneyuki Hagiwara "Current technological status of spatial filtering method for soft defect detection", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212796

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