Fast optical proximity correction: analytical method

Satomi Shioiri; Hiroyoshi Tanabe

doi:10.1117/12.209258

26 May 1995 Fast optical proximity correction: analytical method

Satomi Shioiri, Hiroyoshi Tanabe

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209258
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In automating optical proximity correction, calculation speed becomes important. In this paper we present a novel method for calculating proximity corrected features analytically. The calculation will take only several times the amount it takes to calculate intensity of one point on wafer. Therefore, the calculation will become extremely faster than conventional repetitive aerial image calculations. This method is applied to a simple periodic pattern. The simulated results show great improvement on linearity after correction and have proved the effectiveness of this analytical method.

Citation Download Citation

Satomi Shioiri and Hiroyoshi Tanabe "Fast optical proximity correction: analytical method", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209258

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