Excimer-laser-beam-scanning chemical vapor deposition of ultrathin multilayer films for soft x-ray mirrors

Katsuhiko Mutoh; Yuka Yamada; Shigeru Takeyama; Takeo Miyata

doi:10.1117/12.206258

10 April 1995 Excimer-laser-beam-scanning chemical vapor deposition of ultrathin multilayer films for soft x-ray mirrors

Katsuhiko Mutoh, Yuka Yamada, Shigeru Takeyama, Takeo Miyata

Author Affiliations +

Proceedings Volume 2403, Laser-Induced Thin Film Processing; (1995) https://doi.org/10.1117/12.206258
Event: Photonics West '95, 1995, San Jose, CA, United States

Abstract

The authors describe a newly developed laser-induced chemical vapor deposition (LCVD) process using an argon-fluoride excimer laser. The LCVD apparatus is equipped with an ultrahigh-vacuum chamber system including an Auger electron spectroscopy (AES) analysis chamber and a focused laser-beam scanning system. Hydrogenated amorphous silicon films free from oxygen contamination are confirmed to be fabricated using the AES analysis before exposing the films to air. Silicon film oxidation process after prolonged exposure to air is also characterized using the AES analysis. Furthermore, the new LCVD process is applied to the fabrication of soft x-ray multilayer mirrors. A tungsten-silicon multilayer mirror with a laterally varying film thickness for high performance soft x-ray focusing systems is successfully obtained on the design rule.

Citation Download Citation

Katsuhiko Mutoh, Yuka Yamada, Shigeru Takeyama, and Takeo Miyata "Excimer-laser-beam-scanning chemical vapor deposition of ultrathin multilayer films for soft x-ray mirrors", Proc. SPIE 2403, Laser-Induced Thin Film Processing, (10 April 1995); https://doi.org/10.1117/12.206258

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