Filtered vacuum arc deposition of semiconductor thin films

Raymond Boxman; Samuel Goldsmith; Amir Ben-Shalom; Larissa Kaplan; David Arbilly; Evgeny Gidalevich; Vladimir Zhitomirsky; Amiel Ishaya; Michael Keidar; Isak Beilis

doi:10.1117/12.174615

1 May 1994 Filtered vacuum arc deposition of semiconductor thin films

Raymond Boxman, Samuel Goldsmith, Amir Ben-Shalom, Larissa Kaplan, David Arbilly, Evgeny Gidalevich, Vladimir Zhitomirsky, Amiel Ishaya, Michael Keidar, Isak Beilis

Author Affiliations +

Proceedings Volume 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum; (1994) https://doi.org/10.1117/12.174615
Event: XVI International Symposium on Discharges and Electrical Insulation in Vacuum, 1994, Moscow-St. Petersburg, Russian Federation

Abstract

The cathode spot vacuum produces a jet of highly ionized plasma plus a spray of liquid droplets, both consisting of cathode material. The droplets are filtered from the plasma by passing the plasma through a curved, magnetic duct. A radial magnetic field may be applied to the face of the cathode to rotate and distribute the cathode spots in order to obtain even erosion and avoid local overheating.

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Raymond Boxman, Samuel Goldsmith, Amir Ben-Shalom, Larissa Kaplan, David Arbilly, Evgeny Gidalevich, Vladimir Zhitomirsky, Amiel Ishaya, Michael Keidar, and Isak Beilis "Filtered vacuum arc deposition of semiconductor thin films", Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); https://doi.org/10.1117/12.174615

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