Laser reactive ablation deposition of titanium nitride and titanium carbide films

Emilia D'Anna; Gilberto Leggieri; Armando Luches; Maurizio Martino; Alessio Perrone; Guiseppe Majni; Paolo Mengucci; Ion N. Mihailescu

doi:10.1117/12.193108

4 November 1994 Laser reactive ablation deposition of titanium nitride and titanium carbide films

Emilia D'Anna, Gilberto Leggieri, Armando Luches, Maurizio Martino, Alessio Perrone, Guiseppe Majni, Paolo Mengucci, Ion N. Mihailescu

Author Affiliations +

Proceedings Volume 2246, Laser Materials Processing and Machining; (1994) https://doi.org/10.1117/12.193108
Event: Optics for Productivity in Manufacturing, 1994, Frankfurt, Germany

Abstract

Titanium nitride and titanium carbide films were deposited on silicon substrates by XeCl excimer laser reactive ablation of titanium in nitrogen and methane atmospheres, respectively. A series of 10,000 pulses at the fluence of approximately 5 J/cm² and repetition rate of 10 Hz were directed to the target. The pressure in the chamber was fixed, during every irradiation series, at a given value within the range 6 X 10^-4 - 10 mbar of N₂ or CH₄. Very flat films with thickness exceeding 1 micrometers were deposited. The structural characteristics of the deposited films were investigated by Rutherford backscattering spectrometry, scanning electron microscopy, and by x-ray diffraction. Under specific experimental conditions very pure nitride films were deposited.

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Emilia D'Anna, Gilberto Leggieri, Armando Luches, Maurizio Martino, Alessio Perrone, Guiseppe Majni, Paolo Mengucci, and Ion N. Mihailescu "Laser reactive ablation deposition of titanium nitride and titanium carbide films", Proc. SPIE 2246, Laser Materials Processing and Machining, (4 November 1994); https://doi.org/10.1117/12.193108

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