Grating reflectors for erbium-doped lithium niobate waveguide lasers

Juergen Soechtig; Helmut Schuetz; Richard Widmer; Hans W. Lehmann; Robert Gross

doi:10.1117/12.180951

28 July 1994 Grating reflectors for erbium-doped lithium niobate waveguide lasers

Juergen Soechtig, Helmut Schuetz, Richard Widmer, Hans W. Lehmann, Robert Gross

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180951
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

A grating fabrication technology has been established for producing DFB- /DBR-grating structures in Er-doped Ti:LiNbO₃ waveguide lasers. It is based on holographically defined resist gratings transferred into the surface of LiNbO₃ waveguides using reactive ion etching with SF₆ gas as the dry etching technique. For a sample with a 24 mm long surface relief grating of 346 nm period, a transmission drop of -11.7 dB, a filter bandwidth as small as 0.08 nm, a Bragg resonance wavelength at 1528.4 nm very close to the Erbium absorption line at 1531 nm and excess losses attributed to the grating of only 1 to 2 dB were measured.

Citation Download Citation

Juergen Soechtig, Helmut Schuetz, Richard Widmer, Hans W. Lehmann, and Robert Gross "Grating reflectors for erbium-doped lithium niobate waveguide lasers", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180951

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