UV routes for approaching low temperature dielectrics deposition in III-V technology

Jean Flicstein; B. Leon; Ian W. Boyd

doi:10.1117/12.167555

1 February 1994 UV routes for approaching low-temperature dielectrics deposition in III-V technology

Jean Flicstein, B. Leon, Ian W. Boyd

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167555
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

As a `cold process' photochemical deposition enables us to obtain insulator and dielectric thin films on III-V compounds. To sustain the remarkable progress in the performance of electronic and optical devices may necessitate the utilization of this innocuous processing for novel applications. Possible areas of interest range from simply optically protective coating to layers for highly sophisticated optoelectronic integration of III-V and Si on the same chip.

Citation Download Citation

Jean Flicstein, B. Leon, and Ian W. Boyd "UV routes for approaching low-temperature dielectrics deposition in III-V technology", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167555

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