Employment of design of experiment for optimized development of thin film coatings

Alan C. Barron; Charles M. Kennemore III; Albert F. Slomba; Fred J. Van Milligen

doi:10.1117/12.164980

7 December 1993 Employment of design of experiment for optimized development of thin film coatings

Alan C. Barron, Charles M. Kennemore III, Albert F. Slomba, Fred J. Van Milligen

Proceedings Volume 1993, Quality and Reliability for Optical Systems; (1993) https://doi.org/10.1117/12.164980
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Design of experiment (DOE) methods were employed to optimally develop thin films with respect to optical absorption and mechanical stress performance. The goal of the experiment was to identify key deposition characteristics which would yield very low optical absorption and minimized film stress characteristics. A fractional factorial matrix was utilized for the preliminary portion of the experiment. Key deposition parameters with respect to low absorption and low film stress were identified as a result of the DOE effort. In addition, the interaction effects of each key deposition parameter with other key deposition parameters as a function of performance were identified. Details of the DOE setup, analysis, and evaluation are presented. Subsequent application of statistical process control methods to control these optimized critical parameters during production to ensure consistent, high quality production yields are discussed.

Citation Download Citation

Alan C. Barron, Charles M. Kennemore III, Albert F. Slomba, and Fred J. Van Milligen "Employment of design of experiment for optimized development of thin film coatings", Proc. SPIE 1993, Quality and Reliability for Optical Systems, (7 December 1993); https://doi.org/10.1117/12.164980

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