Stability of krypton fluoride laser in real stepper mode operation

Masahiko Kowaka; Yukio Kobayashi; Osamu Wakabayashi; Noritoshi Ito; Junichi Fujimoto; Takanobu Ishihara; Hiroaki Nakarai; Hakaru Mizoguchi; Yoshiho Amada; Yasuhiro Nozue

doi:10.1117/12.150429

8 August 1993 Stability of krypton fluoride laser in real stepper mode operation

Masahiko Kowaka, Yukio Kobayashi, Osamu Wakabayashi, Noritoshi Ito, Junichi Fujimoto, Takanobu Ishihara, Hiroaki Nakarai, Hakaru Mizoguchi, Yoshiho Amada, Yasuhiro Nozue

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150429
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The stable performance of the line-narrowed Krypton Fluoride Excimer Laser for production steppers, the KLES-G6, in real stepper mode operation is presented. Wavelength stability of < +/- 0.1 pm and pulse-to-pulse energy stability of < 2% ((sigma) ) were achieved in the real stepper mode operation. Further the durability test was made at 6 W(10 mJ, 600 Hz) in 1 sec. ON - 1 sec. OFF (50%) burst mode and in cw mode. The central wavelength stability < +/- 0.2 pm including the drift at the head of burst, spectral bandwidth < 1.5 pm, and pulse-to-pulse energy stability < 2.5% ((sigma) ) over 1.6 X 10⁹ shots were achieved. The KLES-G6 will assist us to utilize the excimer stepper in real commercial production successfully.

Citation Download Citation

Masahiko Kowaka, Yukio Kobayashi, Osamu Wakabayashi, Noritoshi Ito, Junichi Fujimoto, Takanobu Ishihara, Hiroaki Nakarai, Hakaru Mizoguchi, Yoshiho Amada, and Yasuhiro Nozue "Stability of krypton fluoride laser in real stepper mode operation", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150429

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