Exposure alignment compensation method for rim phase-shifting mask fabrication

Minoru Sugawara; Hiroichi Kawahira; Akihiro Ogura; Satoru Nozawa

doi:10.1117/12.150426

8 August 1993 Exposure alignment compensation method for rim phase-shifting mask fabrication

Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, Satoru Nozawa

Author Affiliations +

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150426
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A phase shifting mask exposure alignment compensation method for edge enhancement (PEACE) is proposed as a newly developed rim phase shifting mask fabrication method. In the PEACE method, a compensation pattern with 180 degree phase shift against rim phase is arranged adjacent to the rim pattern. The compensation pattern can effectively reduce secondary peak intensity by a destructive interference which will bring about a considerable enhancement of the registration latitude at the second layer electron beam (EB) exposure. Two PEACE methods, PEACE-1 and PEACE-2, are introduced subject to different compensation pattern arrangements. In the PEACE-1 method, at the second layer EB exposure, the compensation pattern is formed automatically adjacent to one or two rim sides with a width proportional to registration error. For the PEACE-2 method, the compensation pattern region is originally designed peripherally around the rim pattern so as to give no change of inherent rim area even with a considerable registration error.

Citation Download Citation

Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, and Satoru Nozawa "Exposure alignment compensation method for rim phase-shifting mask fabrication", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150426

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