Paper
1 June 1992 Develop end-point detection: a manufacturer's perspective
A. Gary Reid, Kenneth M. Sautter
Author Affiliations +
Abstract
Develop end-point systems compensate for a wide variety of upstream process variables such as dose, soft bake time/temperature variation, and changes in resist thickness. However, questions have been raised about signal repeatability as a factor in controlling the manufacturing process. This paper examines the long-term reliability of develop end-point signals by both identifying and quantifying: (1) the amount of end-point time fluctuation in an image-reversal manufacturing process and the degree to which it correlates with changes in linewidths; (2) reasons for signal noise or changes in end-point time that do not indicate shifts in linewidths; (3) processing problems that lead to shifts in end-point times; (4) developer flow rate as a critical variable in an ultrasonic all-spray develop process; and (5) efforts at IBM to implement a develop end-point system as a turnkey operation.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Gary Reid and Kenneth M. Sautter "Develop end-point detection: a manufacturer's perspective", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59799
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KEYWORDS
Image processing

Signal processing

Semiconducting wafers

Process control

Inspection

Integrated circuits

Metrology

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