Model and measurement of resist heating effect in EBL (Poster Paper)

Sergey V. Babin; Ivan Kostic; A. A. Svintsov

doi:10.1117/12.136030

9 July 1992 Model and measurement of resist heating effect in EBL (Poster Paper)

Sergey V. Babin, Ivan Kostic, A. A. Svintsov

Author Affiliations +

Proceedings Volume 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II; (1992) https://doi.org/10.1117/12.136030
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Measurements of dose characteristics of PMMA were performed with various resist temperatures. The quantitative data shows sensitivity changes with the temperature increase. The model of resist heating effect is presented and a possible technique to correct distortions due to resist heating is discussed.

Citation Download Citation

Sergey V. Babin, Ivan Kostic, and A. A. Svintsov "Model and measurement of resist heating effect in EBL (Poster Paper)", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992); https://doi.org/10.1117/12.136030

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