Resist parameter extraction with graphical user interface in X

Anita S. Chiu; Richard A. Ferguson; Takeshi Doi; Alfred K. K. Wong; Nelson Tam; Andrew R. Neureuther

doi:10.1117/12.46412

1 June 1991 Resist parameter extraction with graphical user interface in X

Anita S. Chiu, Richard A. Ferguson, Takeshi Doi, Alfred K. K. Wong, Nelson Tam, Andrew R. Neureuther

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46412
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A graphical user interface has been developed to run with PARMEX for automatically modeling acid-hardened chemically-amplified resist from dissolution measurement and SAMPLE prediction of material state changes during exposure and bake. This software called PIX-PARMEX (Program user Interface in X-PARMEX) allows the user to view the data while using mouse driven commands in interactively adapting data reduction and curve fitting. PIX-PARMEX has been developed using X windows and UNIX for use on engineering workstations. Standard models found in the literature for process simulation in programs such as SAMPLE and PROLITH are included. Examples are given for the KTI-895i resist with i-line exposure, and the acid-hardened resist, Shipley XP-8843 with deep-UV exposure.

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Anita S. Chiu, Richard A. Ferguson, Takeshi Doi, Alfred K. K. Wong, Nelson Tam, and Andrew R. Neureuther "Resist parameter extraction with graphical user interface in X", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46412

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KEYWORDS

Data modeling

Semiconducting wafers

Human-machine interfaces

Photoresist processing

Picture Archiving and Communication System

Statistical modeling

Data processing

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