Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications

Maaike Op de Beeck; Akira Tokui; Masato Fujinaga; Nobuyuki Yoshioka; Kazuya Kamon; Tetsuro Hanawa; Katsuhiro Tsukamoto

doi:10.1117/12.44781

1 July 1991 Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications

Maaike Op de Beeck, Akira Tokui, Masato Fujinaga, Nobuyuki Yoshioka, Kazuya Kamon, Tetsuro Hanawa, Katsuhiro Tsukamoto

Author Affiliations +

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44781
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Three types of phase-shifting mask designs are studied with respect to their suitability to print periodical L/S structures. The evaluation criteria are DOF, exposure latitude, linearity, and image contrast and slope of the intensity profile. Mask-making issues are also taken into account. The investigation is based on both simulations and experimental results. A fully transparent shifter causing an optical shift of 180 degrees is considered. A negative tone photoresist is used for the exposures with a KrF excimer laser stepper (248 nm).

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Maaike Op de Beeck, Akira Tokui, Masato Fujinaga, Nobuyuki Yoshioka, Kazuya Kamon, Tetsuro Hanawa, and Katsuhiro Tsukamoto "Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44781

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