Angular dependence of thin-film dielectric coating damage thresholds revisited

J. D. Boyer

doi:10.1117/12.2294450

1 November 1990 Angular dependence of thin-film dielectric coating damage thresholds revisited

J. D. Boyer

Proceedings Volume 1438, Laser-Induced Damage in Optical Materials 1989; 143815 (1990) https://doi.org/10.1117/12.2294450
Event: Laser-Induced Damage in Optical Materials 1989, 1989, Boulder, CO, United States

Abstract

Newnam et al. [1] reported experiments showing that the angular dependence of 351-nm laser damage thresholds in HfO2/SiO2 multilayer dielectric reflectors was much weaker than even the 1/cosh expected from simple geometric fluence dilution. Several plausible explanations were suggested, but none were convincing. We propose a simple geometric model based on a cylindrical form for the coating defect responsible for damage initiation. We have measured 248-nm damage thresholds for bare fused silica, evaporated aluminium films, and HfO2/SiO2 and A1203/SiO2 dielectric reflectors at angles out to 85Ã‚Â°. The measured data agree well with our simple model.

Citation Download Citation

J. D. Boyer "Angular dependence of thin-film dielectric coating damage thresholds revisited", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143815 (1 November 1990); https://doi.org/10.1117/12.2294450

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