Paper
10 December 2024 Lithography vacuum and exhaust gas management for EUV high NA
Zhen Ma, Richard Salloum, Jingyuan Zhang, Bin Zhao
Author Affiliations +
Proceedings Volume 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024); 134231G (2024) https://doi.org/10.1117/12.3053555
Event: 8th International Workshop on Advanced Patterning Solutions (IWAPS 2024), 2024, Jiaxing, Zhejiang, China
Abstract
The latest generation of EUV lithography has launched in the market; the higher numeric aperture and more powerful light source bring additional challenges for vacuum and exhaust gas management providers. From an environmental view, EUV owners expect the vacuum subsystem to perform a better carbon footprint than the last generation of the EUV system. This paper will discuss dealing with a higher flow rate of clean hydrogen gas and reducing utility usage simultaneously. The field running result and future improvement plan will be shared. Furthermore, some hydrogen can be reused through an exhaust management system, thus reducing hydrogen consumption by up to 80%.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Zhen Ma, Richard Salloum, Jingyuan Zhang, and Bin Zhao "Lithography vacuum and exhaust gas management for EUV high NA", Proc. SPIE 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024), 134231G (10 December 2024); https://doi.org/10.1117/12.3053555
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KEYWORDS
Hydrogen

Vacuum

Extreme ultraviolet

Extreme ultraviolet lithography

Power consumption

Light sources

Lithography

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