Application of path planning in vector scanning electron beam lithography

Kangpeng Huang; Wenhao Wang; Jiacong Zhao; Siyu Feng; Zhaoyang Lan; Zhensheng Zhang; Xuefeng Song; Dapeng Yu

doi:10.1117/12.3052898

10 December 2024 Application of path planning in vector scanning electron beam lithography

Kangpeng Huang, Wenhao Wang, Jiacong Zhao, Siyu Feng, Zhaoyang Lan, Zhensheng Zhang, Xuefeng Song, Dapeng Yu

Author Affiliations +

Proceedings Volume 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024); 134230J (2024) https://doi.org/10.1117/12.3052898
Event: 8th International Workshop on Advanced Patterning Solutions (IWAPS 2024), 2024, Jiaxing, Zhejiang, China

Abstract

During exposure of vector scanning electron beam lithography, the hysteresis effect of scanning coils and the instability of electron beam current will affect the smoothness of the edge of the exposure pattern. To address this issue, this paper proposes a novel scanning strategy, comprising inward spiral scanning along the edges to expose the periphery of the pattern and meandering scanning to achieve uniform exposure inside the pattern. The experimental results demonstrate that the proposed scanning strategy is capable of exposing patterns with smoother edges than the traditional scanning method.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Kangpeng Huang, Wenhao Wang, Jiacong Zhao, Siyu Feng, Zhaoyang Lan, Zhensheng Zhang, Xuefeng Song, and Dapeng Yu "Application of path planning in vector scanning electron beam lithography", Proc. SPIE 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024), 134230J (10 December 2024); https://doi.org/10.1117/12.3052898

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