The effect of TiO2 film on the surface roughness and optical properties of Mo/Si periodic films by atomic layer deposition

Chao-Te Lee; Wen-Hao Cho; Wei-Chun Chen; Bor-Yuan Shew; Hung-Pin Chen; Cheng-Chung Jaing; Chien-Lin Lee; Kuen-Yu Tsai

doi:10.1117/12.3032256

12 November 2024 The effect of TiO₂ film on the surface roughness and optical properties of Mo/Si periodic films by atomic layer deposition

Chao-Te Lee, Wen-Hao Cho, Wei-Chun Chen, Bor-Yuan Shew, Hung-Pin Chen, Cheng-Chung Jaing, Chien-Lin Lee, Kuen-Yu Tsai

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Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 132150S (2024) https://doi.org/10.1117/12.3032256
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

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Abstract

In this work, the TiO₂ film was deposited on periodic Mo/Si bilayer at various temperatures (70~90°C) by atomic layer deposition (ALD). The H₂O and Tetrakis(dimethylamino)titanium (TDMAT) were be used for precursors. Effects of substrate temperature and thickness of TiO₂ film on the microstructure, surface roughness, and optical properties were investigated by field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), high resolution transmission electron microscope (HRTEM), and extreme ultraviolet (EUV) spectrometer, respectively. It was found that the surface roughness of the TiO₂ film at substrate temperature 70°C was obviously larger than the others. The surface roughness of TiO₂ film was under 0.2nm at the substrate temperature was above 80°C. The reflectivity of periodic Mo/Si bilayer was 66% by EUV spectrometer. We found that the reflectivity of Mo/Si/TiO₂ films was decreased with increased the thickness of TiO₂ film. The reflectivity of the films was maintain 65.97% as the TiO₂ film was 1.8nm. However, the reflectivity of the films was decreased to 59.27% when the TiO₂ film was 3nm. Based on the results of the reflectivity investigation, the TiO₂ thin film by ALD as the protective film for highly reflective EUV mirror was been confirmed.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Chao-Te Lee, Wen-Hao Cho, Wei-Chun Chen, Bor-Yuan Shew, Hung-Pin Chen, Cheng-Chung Jaing, Chien-Lin Lee, and Kuen-Yu Tsai "The effect of TiO₂ film on the surface roughness and optical properties of Mo/Si periodic films by atomic layer deposition", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 132150S (12 November 2024); https://doi.org/10.1117/12.3032256

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