LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics

Dominykas Gustas; Sam Borman; Dorothe Oorschot; Joost Bekaert; Hilbert Van Loo; Frank Horsten; Vidya Vaenkatesan; Alberto Colina; Tasja van Rhee

doi:10.1117/12.3034695

12 November 2024 LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics

Dominykas Gustas, Sam Borman, Dorothe Oorschot, Joost Bekaert, Hilbert Van Loo, Frank Horsten, Vidya Vaenkatesan, Alberto Colina, Tasja van Rhee

Author Affiliations +

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 132150Q (2024) https://doi.org/10.1117/12.3034695
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

LCDU is a known measurable metric for studying imaging contrast in semiconductor lithography. It is rather common to separate it into systematic and stochastic subcomponents using ANOVA decomposition technique. In this work we present several experiments performed on an ASML NXE scanner to showcase what practical learnings this type of decomposition can bring, and how it could potentially be useful in process setup, monitoring and diagnostics. Firstly, we study reticle impact on the LCDU systematics and local MEEF, and demonstrate the consequences for process correctability using standard scanner tuning knobs such as dose and focus. Secondly, we highlight experimentally the difference between how strongly resist parameters, such as layer thickness, affect systematic and stochastic LCDU terms, and compare our data with scaling laws from an established model. Finally, we make an observation on how a classical ANOVA-based method to determine metrology contribution has limitations due to random destructive resist-SEM beam interaction, and discuss ramifications for interpreting the overall measured LCDU values.

Conference Presentation

Citation Download Citation

Dominykas Gustas, Sam Borman, Dorothe Oorschot, Joost Bekaert, Hilbert Van Loo, Frank Horsten, Vidya Vaenkatesan, Alberto Colina, and Tasja van Rhee "LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 132150Q (12 November 2024); https://doi.org/10.1117/12.3034695

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