Optical and mechanical properties of PIAD deposited HfO2 single layers

G. Abromavicius; R. Juškenas

doi:10.1117/12.3026740

24 June 2024 Optical and mechanical properties of PIAD deposited HfO₂ single layers

G. Abromavicius, R. Juškenas

Proceedings Volume 13020, Advances in Optical Thin Films VIII; 1302012 (2024) https://doi.org/10.1117/12.3026740
Event: SPIE Optical Systems Design, 2024, Strasbourg, France

Abstract

Single HfO₂ layers were deposited on fused silica substrates using Hf as a starting material by PIAD technology. Inductively coupled RF plasma source was used, generating pure oxygen, as well as argon-oxygen mixture plasma. Mean plasma ion energies were varied from ~120 to ~270 eV. Optical properties, stress values, direct absorption for 1064 nm, surface roughness, film structure were determined for the samples and were also compared to pure e-beam and IBS formed HfO₂ single layers. It is shown, that by selecting proper plasma parameters it’s possible to obtain HfO₂ layer with 185 MPa compressive stress, suitable for making dense multilayer coatings with moderate compressive stresses. However, simultaneously obtained high optical absorption and extinction implies necessity for further investigations.

Citation Download Citation

G. Abromavicius and R. Juškenas "Optical and mechanical properties of PIAD deposited HfO₂ single layers", Proc. SPIE 13020, Advances in Optical Thin Films VIII, 1302012 (24 June 2024); https://doi.org/10.1117/12.3026740

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