Presentation + Paper
20 June 2024 Scalable hyperuniform and flexible photonic devices based on dielectric antennas realized by solid state dewetting
Author Affiliations +
Abstract
We present a novel, simple and low-cost protocol for fabricating pure Si, or Si1−xGex or Ge-based, sub-micrometric dielectric antennas with ensuing hybrid integration into different plastic supports. The dielectric antennas are realized exploiting the natural instability of thin solid films to form regular patterns of monocrystalline atomically smooth SiGe nanostructures that cannot be realized with conventional methods. By adjusting the annealing treatment and the semiconductor film thicknesses, different classes of nanoarchitectures can be formed, from elongated and periodic structures to disordered structures with a footprint of just a few tens of nm. This latter disordered case presents a significant suppression of the large-scale fluctuations that are conventionally observed in ordered systems and shows an almost hyperuniform behavior character.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Sonia Freddi, Michele Gherardi, Arianna Brescia, Alexey Fedorov, Andrea Chiappini, and Monica Bollani "Scalable hyperuniform and flexible photonic devices based on dielectric antennas realized by solid state dewetting", Proc. SPIE 13003, Fiber Lasers and Glass Photonics: Materials through Applications IV, 130030S (20 June 2024); https://doi.org/10.1117/12.3025888
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Dewetting

Dielectrics

Polydimethylsiloxane

Annealing

Antennas

Scanning electron microscopy

RELATED CONTENT

3D-printed infrared metamaterials
Proceedings of SPIE (February 21 2019)
MEMS above IC technology applied to a compact RF module
Proceedings of SPIE (July 01 2005)
Wafer current measurement for process monitoring
Proceedings of SPIE (May 10 2005)
Small Au/SAM/Au junctions by EB lithography
Proceedings of SPIE (July 01 2003)

Back to Top