High steepness aspheric polishing trajectory planning based on equal arc length sampling

Xuefei Zhao; Shanshan Wang; Nansheng Zhang; Qun Hao; Feng Shi

doi:10.1117/12.3000163

18 December 2023 High steepness aspheric polishing trajectory planning based on equal arc length sampling

Xuefei Zhao, Shanshan Wang, Nansheng Zhang, Qun Hao, Feng Shi

Proceedings Volume 12964, AOPC 2023: Optical Design and Manufacturing ; 1296403 (2023) https://doi.org/10.1117/12.3000163
Event: Applied Optics and Photonics China 2023 (AOPC2023), 2023, Beijing, China

Abstract

As a kind of common aspheric element, high-gradient aspheric surface is more and more used in high-tech fields because of its advantages of improving system accuracy and optimizing system comprehensive performance. At the same time, it also has higher requirements for its surface processing quality. The trajectory planning in polishing is an important part that affects the surface quality of the component. Due to the continuous change of the curvature radius of the high-steep aspheric surface and the large change rate of the vector height, the commonly used planar equidistant grating scanning trajectory is projected onto its surface. The distribution of trajectory points on the surface is obviously uneven, resulting in over polishing or under polishing in some areas. In order to ensure the machining accuracy of high-gradient aspheric surface, the concept of “common equal arc length point” is proposed and the equal arc length trajectory point planning model is established to make the spatial distance of any adjacent trajectory points on the aspheric surface consistent, and the spatial interval change rate is introduced to quantitatively analyze the distribution of trajectory points. Several aspheric surfaces with different vector height change rates are sampled by the equal arc length trajectory point model. Under the same sampling accuracy as the plane equidistant grid scanning trajectory point model, the change rate of the trajectory point spacing to the surface shape is reduced from 70.72 % ~ 33.03 %to 25.18%~8.75 %. The simulation results show the effectiveness of the model.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Xuefei Zhao, Shanshan Wang, Nansheng Zhang, Qun Hao, and Feng Shi "High steepness aspheric polishing trajectory planning based on equal arc length sampling", Proc. SPIE 12964, AOPC 2023: Optical Design and Manufacturing , 1296403 (18 December 2023); https://doi.org/10.1117/12.3000163

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KEYWORDS

Aspheric lenses

Surface finishing

Polishing

Optical surfaces

Convolution

Sampling rates

Materials processing

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