Formation of nano-cone structures on silicon via maskless reactive ion etching

Jiacheng Lin; Hao Liu; Chen Jiang; Qi Wang; Kai Liu; Xiaomin Ren

doi:10.1117/12.3008000

18 December 2023 Formation of nano-cone structures on silicon via maskless reactive ion etching

Jiacheng Lin, Hao Liu, Chen Jiang, Qi Wang, Kai Liu, Xiaomin Ren

Proceedings Volume 12961, AOPC 2023: Nanophotonics ; 129610C (2023) https://doi.org/10.1117/12.3008000
Event: Applied Optics and Photonics China 2023 (AOPC2023), 2023, Beijing, China

Abstract

We report a maskless reactive ion etching (RIE) method that employs O2, CHF3 and SF6&O2 gas plasma sequentially to generate nano-cones structures on silicon substrates with good uniformity. In this method, nano-cones are made under carefully-controlled conditions that restrict their width and height to 60 nm and 82 nm, respectively. According to the formation trend of nano-cones under different plasma conditions, the contributing mechanism is discussed. With the multiple effects of etching time, chamber pressure and self-bias voltage, the height, angle and density of nano-cones will be varied within a certain range. Given these variations, a nano-cone structure with good uniformity was generated using the following parameters: etching time of 300 s, chamber pressure of 40 mtorr, self-bias voltage of 75 W, and a SF6&O2 flow ratio of 75 sccm: 75 sccm. The experiment in this report demonstrates a promising way to fabricate silicon-based nano-cone structures for photonic and optoelectronic applications, with advantages of the controllability and compatibility of its dry-etching process.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jiacheng Lin, Hao Liu, Chen Jiang, Qi Wang, Kai Liu, and Xiaomin Ren "Formation of nano-cone structures on silicon via maskless reactive ion etching", Proc. SPIE 12961, AOPC 2023: Nanophotonics , 129610C (18 December 2023); https://doi.org/10.1117/12.3008000

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Etching

Silicon

Reactive ion etching

Oxides

Plasma

Scanning electron microscopy

Vacuum chambers

Show All Keywords

Keywords/Phrases

Search In:

Publication Years