New PE filter for advanced photolithography process

Jinhong Yu; Mengze Chen; Robb Fang; Yoshiaki Yamada

doi:10.1117/12.3010100

9 April 2024 New PE filter for advanced photolithography process

Jinhong Yu, Mengze Chen, Robb Fang, Yoshiaki Yamada

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571P (2024) https://doi.org/10.1117/12.3010100
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

The polyethylene (PE) membrane plays a crucial role in the semiconductor industry for bulk photochemical and photoresist filtration, owing to its exceptional particle retention capability and substantial chemical compatibility. Over the past few decades, researchers have made significant advancements in the development of polyethylene membranes with smaller pores in order to mitigate product defectivity. The necessity for filtration, however, has grown in tandem with the progress of the semiconductor manufacturing process. Based on the growing demands, there is a need to explore innovative membranes that possess enhanced particle retention ability and cleanliness levels. In this research, we created a new 1 nm PE filter, exhibiting exceptional filtration capabilities. Therefore, this research aimed to compare the differences between the new 1nm PE filter and the traditional 1nm PE filter, as well as to analyze the factors that contribute to the superior performance of the new 1nm PE filter.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jinhong Yu, Mengze Chen, Robb Fang, and Yoshiaki Yamada "New PE filter for advanced photolithography process", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571P (9 April 2024); https://doi.org/10.1117/12.3010100

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