Outgassing, bond structure, and thickness in polymers under electron exposure

Maximillian W. Mueller; Terry McAfee; Patrick Naulleau; Dahyun Oh; Oleg Kostko

doi:10.1117/12.3010981

10 April 2024 Outgassing, bond structure, and thickness in polymers under electron exposure

Maximillian W. Mueller, Terry McAfee, Patrick Naulleau, Dahyun Oh, Oleg Kostko

Author Affiliations +

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129570C (2024) https://doi.org/10.1117/12.3010981
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

EUV photon-generated primary and secondary electrons, produced by a cascade of inelastic scattering events, have a wide range of energies and drive EUV patterning by initiating chemical transformations. To study electron-induced chemistry we exposed photoresist films to an electron beam varied from 20 to 80 eV. Chemical transformations were characterized using a residual gas analyzer, FTIR, and ellipsometry. Total outgassing was determined for key fragments and compared to film thickness changes via ellipsometry and FTIR bond structure changes. Estimates of electron penetration depth and reaction efficiency (bonds broken per electron) will be presented.

Conference Presentation

Citation Download Citation

Maximillian W. Mueller, Terry McAfee, Patrick Naulleau, Dahyun Oh, and Oleg Kostko "Outgassing, bond structure, and thickness in polymers under electron exposure", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129570C (10 April 2024); https://doi.org/10.1117/12.3010981

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