EUV optics at ZEISS: status, outlook, and future

Joachim Kalden; Jens Timo Neumann; Dirk Jürgens; Paul Gräupner; Wolfgang Seitz; Peter Kürz

doi:10.1117/12.3010847

10 April 2024 EUV optics at ZEISS: status, outlook, and future

Joachim Kalden, Jens Timo Neumann, Dirk Jürgens, Paul Gräupner, Wolfgang Seitz, Peter Kürz

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 129530Q (2024) https://doi.org/10.1117/12.3010847
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

With the first delivery from ASML to Intel end of 2023, the next generation of EUV systems with ZEISS optics has found its way to the first high-end chip manufacturer. The increased numerical aperture (NA) of 0.55 compared to stateof-the-art EUV optics with a NA of 0.33, the new generation of NA=0.55 EUV scanners allow to support Moore’s law for at least another decade. Besides the new NA=0.55 EUV systems, ZEISS and ASML also continuously improve the current EUV scanners by enabling higher throughputs combined with improved imaging performance. We will present an overview over the status and key facts of the new NA=0.55 EUV optics as well as the latest performance improvements achieved for EUV systems with NA of 0.33. Furthermore, we will provide a glance at the EUV optics roadmap and provide give an outlook on what can be expected for EUV optics in future.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Joachim Kalden, Jens Timo Neumann, Dirk Jürgens, Paul Gräupner, Wolfgang Seitz, and Peter Kürz "EUV optics at ZEISS: status, outlook, and future", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 129530Q (10 April 2024); https://doi.org/10.1117/12.3010847

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