Paper
29 September 2023 11th annual eBeam initiative survey reports EUV fueling photomask growth
Author Affiliations +
Abstract
The eBeam Initiative completed its 11th annual opinion survey in July 2022 with anonymous feedback from industry luminaries representing 44 companies from across the semiconductor ecosystem – including photomasks, electronic design automation (EDA), chip design, equipment, materials, manufacturing and research. Started in 2012, the Luminaries Survey is used each year to gather predictions of industry trends. 2022 survey results reflect that EUV is fueling the photomask industry as 78 percent of survey respondents believe that EUV lithography will contribute to photomask (mask) revenue growth. EUV remains the top reason cited by survey respondents for purchasing multi-beam mask writers. Access to multi-beam mask writers is seen as less of a barrier to curvilinear mask making compared to the 2021 survey. Confidence among luminaries in curvilinear mask making remains high, with 76 percent of respondents indicating that leading-edge mask shops can handle at least a limited number of such masks. With EUV providing the fuel, optimism for overall photomask market growth continued in 2022 with 70 percent of survey respondents predicting that mask revenues in 2022 will increase compared to 2021 revenues.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aki Fujimura and Jan Willis "11th annual eBeam initiative survey reports EUV fueling photomask growth", Proc. SPIE 12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150E (29 September 2023); https://doi.org/10.1117/12.2683454
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet

High volume manufacturing

Photomasks

Inspection

Pellicles

Deep learning

Industry

RELATED CONTENT

NXE pellicle offering a EUV pellicle solution to the...
Proceedings of SPIE (March 18 2016)
NXE pellicle: development update
Proceedings of SPIE (September 26 2016)
EUVL is being inserted in manufacturing in 2019 What...
Proceedings of SPIE (August 29 2019)
Through the looking glass what is on the horizon...
Proceedings of SPIE (May 28 2003)

Back to Top