Abstract
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ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510667877

ISBN: 9781510667884 (electronic)

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Symposium Committee

General Chairs

  • Ying Gu, President, Chinese Optical Society (China) and PLA General Hospital (China)

  • Wenqing Liu, Vice President, Chinese Optical Society (China) and Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)

Technical Program Chairs

  • Zejin Liu, Vice President, Chinese Optical Society (China) and National University of Defense Technology (China)

  • Xiangang Luo, Institute of Optics and Electronics, Chinese Academy of Sciences (China)

  • Xingde Li, Johns Hopkins University (United States)

Technical Program Co-chairs

  • Wei Huang, Northwestern Polytechnical University (China)

  • Guobin Fan, China Academy of Engineering Physics (China)

  • Qingming Luo, Hainan University (China)

  • Ninghua Zhu, Institute of Semiconductors, Chinese Academy of Sciences (China)

  • Fengyi Jiang, Nanjing University (China)

Organizing Committee

  • Suotang Jia, Vice President, Chinese Optical Society (China) and Shanxi University (China)

  • Xiaomin Ren, Vice President, Chinese Optical Society (China) and Beijing University of Posts and Telecommunications (China)

  • Wenjie Wang, Vice President, Chinese Optical Society (China) and Sunny Optical Technology (Group) Co., Ltd. (China)

  • Jianda Shao, Vice President, Chinese Optical Society (China) and Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)

  • Hong Jin, Vice President, Chinese Optical Society (China) and Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences (China)

  • Yunquan Liu, Vice President, Chinese Optical Society (China) and Peking University (China)

  • Xinliang Zhang, Xidian University (China)

  • Yanqing Lu, Nanjing University (China)

  • Chuanfeng Li, University of Science and Technology of China (China)

  • Wei Hao, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences (China)

  • Qun Hao, Changchun University of Science and Technology (China)

  • Yidong Huang, Tsinghua University (China)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Xiaocong Yuan, Shenzhen University (China)

  • Limin Tong, Zhejiang University (China)

  • Xiaoying Li, Tianjin University (China)

  • Yan Li, Peking University (China)

  • Jianxin Chen, Fujian Normal University (China)

  • Weiwei Liu, Nankai University (China)

  • Jian Wang, Huazhong University of Science and Technology (China)

Secretaries-General

  • Xu Liu, Secretary General, Chinese Optical Society (China) and Zhejiang University (China)

  • Bo Gu, Deputy Secretary General, Chinese Optical Society (China)

  • Hong Yang, Deputy Secretary General, Chinese Optical Society (China) and Peking University (China)

  • Tianrui Zhai, Deputy Secretary General, Chinese Optical Society (China) and Beijing University of Technology (China)

Local Organizing Committee Chair

  • Xu Liu, Secretary General, Chinese Optical Society (China) and Zhejiang University (China)

Local Organizing Committee Co-chairs

  • Hong Yang, Deputy Secretary General, Chinese Optical Society (China) and Peking University (China)

  • Yuhong Wan, Beijing University of Technology (China)

  • Liquan Dong, Beijing Institute of Technology (China)

Local Organizing Committee

  • Wei Xiong, Chinese Optical Society (China)

  • Yu Xiang, Peking University (China)

  • Yong Zeng, Beijing University of Technology (China)

  • Nan Zhang, Beijing Institute of Technology (China)

  • Ruiqing Jia, Chinese Optical Society (China)

  • Xiao Li, The Chinese Optical Society (China)

  • Jianxin Sun, Chinese Optical Society (China)

Technical Organizing Committee

  • Hossein Asghari, Loyola Marymount University (United States)

  • Liangcai Cao, Tsinghua University (China)

  • P. Scott Carney, The Institute of Optics, University of Rochester (United States)

  • Benyong Chen, Zhejiang Sci-Tech University (China)

  • Qionghai Dai, Tsinghua University (China)

  • Gerd Ehret, Physikalisch-Technische Bundesanstalt (Germany)

  • Xinyu Fan, Shanghai Jiao Tong University (China)

  • Zheyu Fang, Peking University (China) and Rice University (United States)

  • Ying Gu, Chinese PLA General Hospital (China)

  • Sen Han, University of Shanghai for Science and Technology (China) and Suzhou H&L Instruments LLC (China)

  • Ingmar Hartl, Deutsches Elektronen-Synchrotron (Germany)

  • Qiongyi He, Peking University (China)

  • Werner Hofmann, Deutsches Patent- und Markenamt (Germany)

  • Minghui Hong, Xiamen University (China)

  • Shibin Jiang, AdValue Photonics, Inc. (United States)

  • Tina Kidger, Kidger Optics Associates (United Kingdom)

  • Chang-Seok Kim, Pusan National University (Korea, Republic of)

  • Dai-Sik Kim, Ulsan National Institute of Science and Technology (Korea, Republic of)

  • Chuan-Feng Li, University of Science and Technology of China (China)

  • Xingde Li, Johns Hopkins University (United States)

  • Ming Li, Institute of Semiconductors, Chinese Academy of Sciences (China)

  • Baojun Li, Jinan University (China)

  • Wei Li, Institute of Semiconductors, Chinese Academies of Sciences (China)

  • Jun Liu, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)

  • Qingming Luo, Hainan University (China)

  • Ting-Chung Poon, Virginia Polytechnic Institute and State University (United States)

  • Yuji Sano, Institute for Molecular Science (Japan) and Osaka University (Japan)

  • Kebin Shi, Peking University (China)

  • Nuannuan Shi, Institute of Semiconductors, Chinese Academy of Sciences (China)

  • Tsutomu Shimura, The University of Tokyo (Japan)

  • Samuel Stranks, University of Cambridge (United Kingdom)

  • Takuo Tanaka, RIKEN (Japan)

  • Masahiko Tani, University of Fukui (Japan)

  • Limin Tong, Zhejiang University (China)

  • Kazumi Wada, Massachusetts Institute of Technology (United States)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Jianpu Wang, Nanjing University of Technology (China)

  • Ting Wang, Institute of Physics, Chinese Academy of Sciences (China)

  • Rengmao Wu, Zhejiang University (China)

  • Rongshi Xiao, Beijing University of Technology (China)

  • Minghong Yang, Wuhan University of Technology (China)

  • Jianhua Yao, Zhejiang University of Technology (China)

  • Hiroshi Yoshikawa, Nihon University (Japan)

  • Changyuan Yu, The Hong Kong Polytechnic University (Hong Kong, China)

  • Xiao-Cong Yuan, Shenzhen University (China)

  • Jianzhong Zhang, Harbin Engineering University (China)

  • Xuping Zhang, Nanjing University (China)

  • Xinliang Zhang, Wuhan National Research Center for Optoelectronics (China)

  • Cunlin Zhang, Capital Normal University (China)

  • Xi-Cheng Zhang, The Institute of Optics, University of Rochester (United States)

  • Zhenrong Zheng, Zhejiang University (China)

  • Haizheng Zhong, Beijing Institute of Technology (China)

  • Changhe Zhou, Jinan University (China)

  • Zhiping Zhou, Peking University (China)

  • Rui Zhu, Peking University (China)

  • Dan Zhu, Huazhong University of Science and Technology (China)

Conference Committee

Conference Chairs

  • Sen Han, University of Shanghai for Science and Technology (China) and Suzhou H&L Instruments LLC (China)

  • Gerd Ehret, Physikalisch-Technische Bundesanstalt (Germany)

  • Benyong Chen, Zhejiang Sci-Tech University (China)

Conference Program Committee

  • Masato Aketagawa, Nagaoka University of Technology (Japan)

  • Yasuhiko Arai, Kansai University (Japan)

  • Yasuhiro Awatsuji, Kyoto Institute of Technology (Japan)

  • James H. Burge, Arizona Optical Metrology LLC (United States)

  • Garrett D. Cole, Thorlabs Crystalline Solutions (United States)

  • Junfei Dai, Zhejiang University (China)

  • Fabian Duerr, Vrije Universiteit Brussel (Belgium)

  • Yuegang Fu, Changchun University of Science and Technology (China)

  • Ming Jiang, Suzhou University of Science and Technology (China)

  • Lianhua Jin, University of Yamanashi (Japan)

  • Kazuhide Kamiya, Toyama Prefectural University (Japan)

  • Tina E. Kidger, Kidger Optics Associates (United Kingdom)

  • Malgorzata Kujawinska, Warsaw University of Technology (Poland)

  • Chao-Wen Liang, National Central University (Taiwan)

  • Yuxiang Lin, ASML (United States)

  • Yasuhiro Mizutani, Osaka University (Japan)

  • Yukitoshi Otani, Utsunomiya University (Japan)

  • Giancarlo Pedrini, Institut für Technische Optik (Germany)

  • Xiang Peng, Shenzhen University (China)

  • Qian Kemao, Nanyang Technological University (Singapore)

  • Jaejoong Kwon, SAMSUNG Display Co., Ltd. (Korea, Republic of)

  • Guohai Situ, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)

  • H. Philip Stahl, NASA Marshall Space Flight Center (United States)

  • John C. Stover, The Scatter Works Inc. (United States)

  • Takamasa Suzuki, Niigata University (Japan)

  • Toshitaka Wakayama, Saitama Medical University (Japan)

  • Haoyu Wang, University of Shanghai for Science and Technology (China)

  • Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)

  • Yajun Wang, Wuhan University (China)

  • Quanying Wu, Suzhou University of Science and Technology (China)

  • Jiangtao Xi, University of Wollongong (Australia)

  • Jing Xu, Tsinghua University (China)

  • Lianxiang Yang, Oakland University (United States)

  • Dawei Zhang, University of Shanghai for Science and Technology (China)

  • Hao Zhang, Tianjin University (China)

  • Qican Zhang, Sichuan University (China)

  • Xiangchao Zhang, Fudan University (China)

  • Zonghua Zhang, Hebei University of Technology (China)

  • Ping Zhou, ASML US, Inc. (United States)

  • Ping Zhong, Donghua University (China)

  • Weihu Zhou, Institute of Microelectronics, Chinese Academy of Sciences (China)

  • Chao Zuo, Nanjing University of Science and Technology (China)

© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 12769", Proc. SPIE 12769, Optical Metrology and Inspection for Industrial Applications X, 1276901 (22 December 2023); https://doi.org/10.1117/12.3018391
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KEYWORDS
Atmospheric optics

Adaptive optics

Biomedical optics

Geometrical optics

Defense technologies

Error analysis

Lithium

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