TEUS: high-brightness EUV LPP light source based on fast rotating target: product overview and specifications

Mikhail Krivokorytov; Konstantin Koshelev; Alexander Vinokhodov; Oleg Yakushev; Vladimir Ivanov; Vladimir Krivtsun; Alexander Lash; Vyacheslav Medvedev; Vladimir Gubarev; Denis Glushkov; Samir Ellwi; Eugene Gorsky; Alexey Kiselev

doi:10.1117/12.2601008

28 September 2021 TEUS: high-brightness EUV LPP light source based on fast rotating target: product overview and specifications

Mikhail Krivokorytov, Konstantin Koshelev, Alexander Vinokhodov, Oleg Yakushev, Vladimir Ivanov, Vladimir Krivtsun, Alexander Lash, Vyacheslav Medvedev, Vladimir Gubarev, Denis Glushkov, Samir Ellwi, Eugene Gorsky, Alexey Kiselev

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118541A (2021) https://doi.org/10.1117/12.2601008
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Conference Poster

Abstract

We present performance metrics for the commercially available TEUS product line. TEUS-S is a high-brightness EUV LPP light source based on a fast rotating liquid metal target with EUV collection angle of 0.05sr. The TEUS-S100 and S400 models employing 100W and 400W of average laser power respectively have been characterized wi0th particular attention to the collector optics lifetime. It is estimated that 10% mirror reflectivity degradation will occur after 2 years for the TEUS-S100 and after 0.5 year for the TEUS-S400 in 24/7operation mode. The TEUS-S400 source provides more than 30 mW of in-band (±1%) EUV radiation after the debris mitigation system.

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Mikhail Krivokorytov, Konstantin Koshelev, Alexander Vinokhodov, Oleg Yakushev, Vladimir Ivanov, Vladimir Krivtsun, Alexander Lash, Vyacheslav Medvedev, Vladimir Gubarev, Denis Glushkov, Samir Ellwi, Eugene Gorsky, and Alexey Kiselev "TEUS: high-brightness EUV LPP light source based on fast rotating target: product overview and specifications", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118541A (28 September 2021); https://doi.org/10.1117/12.2601008

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