18 March 2021Experimental study on the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon
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In this paper, the temperature and damage morphology of silicon induced by ms-ns combined-pulse laser with different pulse delay are investigated. The small holes and trapped bubbles were formed on the center of damage morphology when the pulse delay is 0.8ms -1ms. The temperature of target exceeds the melting point and the molten pool begins to be formed before the irradiation of ns laser. It was found that the process of droplet ejection and phase explosion might occurred after the irradiation of ns laser. The relationship between temperature and damage morphology induced by ms–ns combined-pulse laser with different pulse delays was discussed. The results in this paper can provide foundation for ms-ns combined-pulse laser processing of semiconductor materials in the future.
Jingyi Li,Wei Zhang,Yu Zhou,Xiaoyun Zhang,Chenxiao Zhao, andGuangyong Jin
"Experimental study on the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon", Proc. SPIE 11780, Global Intelligent Industry Conference 2020, 117800R (18 March 2021); https://doi.org/10.1117/12.2589823
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Jingyi Li, Wei Zhang, Yu Zhou, Xiaoyun Zhang, Chenxiao Zhao, Guangyong Jin, "Experimental study on the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon," Proc. SPIE 11780, Global Intelligent Industry Conference 2020, 117800R (18 March 2021); https://doi.org/10.1117/12.2589823