Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates

Jiacheng Zhao; Francis J. McCallum; Zhen Jiang; Joshua A. Kaitz; James F. Cameron; Peter Trefonas III; Idriss Blakey; Hui Peng; Andrew K. Whittaker

doi:10.1117/12.2586516

22 February 2021 Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates

Jiacheng Zhao, Francis J. McCallum, Zhen Jiang, Joshua A. Kaitz, James F. Cameron, Peter Trefonas III, Idriss Blakey, Hui Peng, Andrew K. Whittaker

Author Affiliations +

Proceedings Volume 11612, Advances in Patterning Materials and Processes XXXVIII; 116120Q (2021) https://doi.org/10.1117/12.2586516
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Photo-directed orientation control of block copolymer (BCP) domains is a powerful method for generating distinct regions of perpendicular and parallel-aligned lamella in a single film layer. In this study we demonstrate the versatility of Poly(aryl methacrylate) films for controlling the wetting behaviour of PS-b-PMMA films after UV irradiation. Upon exposure to UV light (254 nm), the surface polarity of Poly(aryl methacrylate) films changed due to the photo-Fries rearrangement of the aromatic ester groups. The switch of PS-b-PMMA alignment from parallel to perpendicular lamellar structures was demonstrated after UV exposure to appropriate doses of poly(aryl methacrylate) films. The UV dose required to switch alignment and orientation in a wide range of BCP films can be tailored by rational structural design of the poly(aryl methacrylate). This simple, rapid, cost-effective and flexible approach to controlling BCP orientation makes this photo-directing chemoepitaxy approach promising for block copolymer self-assembly applications.

Conference Presentation

Citation Download Citation

Jiacheng Zhao, Francis J. McCallum, Zhen Jiang, Joshua A. Kaitz, James F. Cameron, Peter Trefonas III, Idriss Blakey, Hui Peng, and Andrew K. Whittaker "Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates", Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120Q (22 February 2021); https://doi.org/10.1117/12.2586516

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