PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
As feature sizes diminish and correction flow complexity increases, it becomes extremely difficult to create homogeneous mask synthesis correction recipes that can pass lithographic verification without some failing hotspots. When encountered in the production line, these areas are frequently fixed quickly so the tapeout can resume and time-tomask is preserved as much as possible. However, these hotspots may occur in future designs, so it is beneficial to update the standard correction recipe with this hotspot information and avoid verification failures before they occur. This paper examines inserting unique hotspot corrections into the standard correction flow using pattern matching to identify the hotspot areas. Standard correction recipes can be updated to accept these hotspot areas and adjust recipe parameters or correction techniques in a standard manner so that these hotspots will be fixed automatically. This automation technique minimizes human interaction with the recipe.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.