Paper
25 March 2020 Block copolymer line roughness measurement via PSD: application to fingerprint samples
Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, Raluca Tiron
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Abstract
This paper introduces line roughness characterization non-straight patterns made of block copolymers (fingerprint patterns). Line Width Roughness have been determined using Power Spectral Density based on a special edge detection developed at CEA-LETI to extract edges contours. We investigated several process parameters impact on LWR such as the degree of polymerization of different BCPs and the impact of UV irradiation on the roughness of the PS block.
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Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, and Raluca Tiron "Block copolymer line roughness measurement via PSD: application to fingerprint samples", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113261I (25 March 2020); https://doi.org/10.1117/12.2551854
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KEYWORDS
Line width roughness

Ultraviolet radiation

Edge detection

Polymethylmethacrylate

Binary data

Directed self assembly

Polymerization

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