The properties of zirconia during the fused silica polishing process

Shijie Zhao; Ruiqing Xie; Xianhua Chen; Defeng Liao; Zhigang Yuan; Jian Wang

doi:10.1117/12.2523929

10 May 2019 The properties of zirconia during the fused silica polishing process

Shijie Zhao, Ruiqing Xie, Xianhua Chen, Defeng Liao, Zhigang Yuan, Jian Wang

Proceedings Volume 11068, Second Symposium on Novel Technology of X-Ray Imaging; 110680V (2019) https://doi.org/10.1117/12.2523929
Event: Second Symposium on Novel Technology of X-Ray Imaging, 2018, Hefei, China

Abstract

In this paper, the polishing properties of the zirconia slurry on the fused silica were studied, comparing with the effect of the ceria polishing. The polyurethane without dopant was applied as polishing pad. The experiment results show that it is easier to produce surface scratches when compared with ceria polishing owing to the high Mohs hardness of zirconia. The surface roughness(Rq) of the workpiece was less than 1nm after polishing with submicron size polishing slurry and suitable polishing pad. The R-on-1 test of 355 nm laser-induced damage threshold for fused silica show that zirconia polishing performance is 3.02% higher, however the exposed subsurface damages with HF etching were more than ceria polishing.The subsurface defect density is 0.10def/cm² (@1μm)with ceria polishing and 1.19def/cm² (@1μm)with zirconia polishing. Based on the fine polishing performance and abundant resources in nature, the zirconia slurry may be an alternative for fused silica polishing in prospect with the appropriate technological solution.

Citation Download Citation

Shijie Zhao, Ruiqing Xie, Xianhua Chen, Defeng Liao, Zhigang Yuan, and Jian Wang "The properties of zirconia during the fused silica polishing process", Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110680V (10 May 2019); https://doi.org/10.1117/12.2523929

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KEYWORDS

Polishing

Zirconium dioxide

Surface finishing

Silica

Particles

Laser damage threshold

Glasses

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