An efficient way of automatic layout decomposition and pattern classification

Zhenzhen Wan; Limei Liu; Huan Kan; Qijian Wan; Xinyi Hu; Zhengfang Liu; Chunshan Du

doi:10.1117/12.2515137

20 March 2019 An efficient way of automatic layout decomposition and pattern classification

Zhenzhen Wan, Limei Liu, Huan Kan, Qijian Wan, Xinyi Hu, Zhengfang Liu, Chunshan Du

Author Affiliations +

Proceedings Volume 10962, Design-Process-Technology Co-optimization for Manufacturability XIII; 1096214 (2019) https://doi.org/10.1117/12.2515137
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

As technology advances, chip size becomes larger and larger, this brings challenges when engineers would like to do a quick investigation of the design in a short time, like hotspot detection and layout fixing. An idea to mitigate the challenges is to decompose a layout into patterns and classify these patterns to unique ones. Engineers then prioritize their work on these unique patterns. Patterns from different products can be accumulated and recorded, when a new design comes in, the known patterns will be filtered out from all unique patterns seen in this new design. When the pattern database is large enough and contains enough safe and weak patterns, machine learning can be used to train the algorithm to predict hotspots in the new design. The key point is how to efficiently decompose a layout and group those patterns. This paper presents how to decompose a layout by using Calibre Pattern Matching and DRC. The experiment data shows that this is a very efficient way to decompose a layout automatically.

Citation Download Citation

Zhenzhen Wan, Limei Liu, Huan Kan, Qijian Wan, Xinyi Hu, Zhengfang Liu, and Chunshan Du "An efficient way of automatic layout decomposition and pattern classification", Proc. SPIE 10962, Design-Process-Technology Co-optimization for Manufacturability XIII, 1096214 (20 March 2019); https://doi.org/10.1117/12.2515137

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