Data Regression Procedure For Comparative Evaluation Of Photolithography Systems

Robert L. Brown; Alan Levine

doi:10.1117/12.953097

19 July 1989 Data Regression Procedure For Comparative Evaluation Of Photolithography Systems

Robert L. Brown, Alan Levine

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953097
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A procedure has been developed for the analysis of the performance of photolithography systems. This procedure uses statistical methods to characterize the system. This is done by using small number of process observations to determine the values of coefficients of an empirical model. The predictions of the model can then be used to determine such factors as the full process volume and anticipated process stability. The method is demonstrated by a case study of an evaluation of a multi-dimensional process space.

Citation Download Citation

Robert L. Brown and Alan Levine "Data Regression Procedure For Comparative Evaluation Of Photolithography Systems", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953097

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