Paper
24 January 2019 Dynamic fractal digital lithography for the fabrication of microlens array
Zhimin Zhang, Zhihuai Liu, Ningning Luo
Author Affiliations +
Abstract
To improve the transverse resolution of digital mask lithography pattern, we present a novel dynamic fractal digital lithography to fabricate microlens array. The basic idea of this technique is to divide a high-frequency digital mask into a group of low-frequency masks by using equal-height-rounding quantization. Consequently, dynamic fractal digital lithography has the advantage in decrease of mask quantity and mask quantization error. Then these low-frequency masks are exposed in sequence and the superimposed exposure of multiple masks takes the place of single exposure of original high-frequency mask. We demonstrate the feasibility of dynamic fractal digital lithography by experimental fabrication. The uniform microlens array with smooth surface and clear edge profile are achieved.
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Zhimin Zhang, Zhihuai Liu, and Ningning Luo "Dynamic fractal digital lithography for the fabrication of microlens array", Proc. SPIE 10840, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics, 1084012 (24 January 2019); https://doi.org/10.1117/12.2504760
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KEYWORDS
Photomasks

Fractal analysis

Lithography

Microlens

Microlens array

Digital micromirror devices

Diffraction

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