Rapid image-based pupil plane characterization for EUV lithography systems

Zac Levinson; Erik Verduijn; Timothy Brunner; Obert Wood; Bruce W. Smith

doi:10.1117/12.2501863

9 October 2018 Rapid image-based pupil plane characterization for EUV lithography systems

Zac Levinson, Erik Verduijn, Timothy Brunner, Obert Wood, Bruce W. Smith

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108090O (2018) https://doi.org/10.1117/12.2501863
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

As the power of laser produced plasma sources has increased, EUV lens heating has become a major component of process variation. Differential lens heating can cause thermal aberrations which affect system drift during operation, therefore pupil plane characterization will play a critical role in process optimization for EUV lithography (EUVL). In-situ full pupil characterization, which depicts the pupil in its in-use state, is essential for these tools. To this end we have developed Quick Inverse Pupil (QUIP)—a software suite developed for rapid characterization of pupil plane behavior based on images formed by that system. This algorithm is based on statistical modeling, which correlates image-space variation with known aberrations. Previously we have presented variations on this algorithm which can only measure third-order aberrations and requires aerial image data. In this paper, we will present an approach to measure high order aberrations from images formed in resist. An inverse pupil solution will be obtained from CD-SEM image analysis. We will show that the additional degrees of freedom required to measure high-order aberrations can be achieved through using different pitches of the metrology targets. We will demonstrate that this technique can accurately determine third- and fifth-order aberrations with a retrieval error below 0.5 miliwaves in under one second. A combination of synthetic and experimental data will be presented.

Conference Presentation

Citation Download Citation

Zac Levinson, Erik Verduijn, Timothy Brunner, Obert Wood, and Bruce W. Smith "Rapid image-based pupil plane characterization for EUV lithography systems", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108090O (9 October 2018); https://doi.org/10.1117/12.2501863

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available